2-Nitro-p-xylylene glycol

Inquiry

Molecular Formula:

C8H9NO4

Molecular Weight:

183.161

CAS Number:

23222-97-1

Catalog Number:

23222-97-1

Product Information

Molecular Formula:

C8H9NO4

Molecular Weight:

183.161

Description

As an antibacterial agent, 2-Nitro-p-xylylene glycol can effectively inhibit the proliferation of harmful bacterial and fungal species, and can be used in the development of drugs to combat occult skin infections caused by bacteria or fungi.

Synonyms

(2-Nitro-1,4-phenylene)dimethanol; 2-Nitro-p-xylene-alpha,alpha'-diol; 1,4-benzenedimethanol, 2-nitro-; [4-(hydroxymethyl)-3-nitrophenyl]methanol; 2-Nitro-1,4-benzenedimethanol; 1,4-Benzenedimethanol,2-nitro-; (2-nitrobenzene-1,4-diyl)dimethanol; 2-Nitro-p-xylylene Glycol, >/=95%; p-Xylene-alpha,alpha'-diol, 2-nitro-

IUPAC Name

[4-(hydroxymethyl)-3-nitrophenyl]methanol

Canonical SMILES

C1=CC(=C(C=C1CO)[N+](=O)[O-])CO

InChI

InChI=1S/C8H9NO4/c10-4-6-1-2-7(5-11)8(3-6)9(12)13/h1-3,10-11H,4-5H2

InChI Key

KWVHOBYJXDKIPL-UHFFFAOYSA-N

Melting Point

95 ℃

Purity

>95.0%(GC)

Computed Properties

XLogP3

Hydrogen Bond Donor Count

Hydrogen Bond Acceptor Count

Rotatable Bond Count

Exact Mass

183.05315777 g/mol

Monoisotopic Mass

183.05315777 g/mol

Topological Polar Surface Area

86.3Å²

Heavy Atom Count

Formal Charge

Complexity

180

Isotope Atom Count

Defined Atom Stereocenter Count

Undefined Atom Stereocenter Count

Defined Bond Stereocenter Count

Undefined Bond Stereocenter Count

Covalently-Bonded Unit Count

Compound Is Canonicalized

Yes

Patents

Publication Number	Title	Priority Date
JP-2018060205-A	Photosensitive resin composition, method for producing cured relief pattern, semiconductor device and display device	2017-11-06
JP-6454769-B2	Photosensitive resin composition, method for producing cured relief pattern, semiconductor device and display device	2017-11-06
JP-2019059915-A	Surface treatment composition, method for producing the same, and surface treatment method using the same	2017-09-26
KR-20190035490-A	Surface treatment composition, preparation method thereof, surface treatment method using the same	2017-09-26
US-2019093051-A1	Surface treatment composition, preparation method thereof, surface treatment method using the same	2017-09-26
US-10858615-B2	Surface treatment composition, preparation method thereof, surface treatment method using the same	2017-09-26
JP-2018160665-A	Semiconductor device and manufacturing method thereof	2017-03-22
TW-I691525-B	Semiconductor device and its manufacturing method	2017-03-22
JP-2018155938-A	Photosensitive resin composition, semiconductor device manufacturing method, resin film, cured resin film, and semiconductor device	2017-03-17
JP-2021113993-A	Photosensitive resin composition, manufacturing method of semiconductor device, resin film, cured resin film, and semiconductor device	2017-03-17

The molarity calculator equation

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The dilution calculator equation

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This equation is commonly abbreviated as: C₁V₁ = C₂V₂

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2-Nitro-p-xylylene glycol

Product Information

Computed Properties

Patents

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