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N-tert-Butyl-N-(2-methyl-1-phenylpropyl)-O-(1-phenylethyl)hydroxylamine

N-tert-Butyl-N-(2-methyl-1-phenylpropyl)-O-(1-phenylethyl)hydroxylamine

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Molecular Formula:

C22H31NO

Molecular Weight:

325.49

CAS Number:

227000-59-1

Catalog Number:

B2699-187954

Catalog Number	Size	Price	Stock	Quantity
B2699-187954	2 g	$4198	In stock

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Product Information

Molecular Formula:

C22H31NO

Molecular Weight:

325.49

Description

Block Copolymer Synthesis Using a Commercially Available NMP Inititator

Synonyms

2,2,5-Trimethyl-3-(1-phenylethoxy)-4-phenyl-3-azahexane, Alkoxyamine NMP initiator

IUPAC Name

N-tert-butyl-2-methyl-1-phenyl-N-(1-phenylethoxy)propan-1-amine

Canonical SMILES

CC(C)C(C1=CC=CC=C1)N(C(C)(C)C)OC(C)C2=CC=CC=C2

InChI

InChI=1S/C22H31NO/c1-17(2)21(20-15-11-8-12-16-20)23(22(4,5)6)24-18(3)19-13-9-7-10-14-19/h7-18,21H,1-6H3

InChI Key

FPFRTDOMIFBPBZ-UHFFFAOYSA-N

Flash Point

>230 °F

Appearance

solid

Storage

−20°C

Refractive Index

n20/D 1.536

Computed Properties

XLogP3

Hydrogen Bond Donor Count

Hydrogen Bond Acceptor Count

Rotatable Bond Count

Exact Mass

325.240564612 g/mol

Monoisotopic Mass

325.240564612 g/mol

Topological Polar Surface Area

12.5Å²

Heavy Atom Count

Formal Charge

Complexity

348

Isotope Atom Count

Defined Atom Stereocenter Count

Undefined Atom Stereocenter Count

Defined Bond Stereocenter Count

Undefined Bond Stereocenter Count

Covalently-Bonded Unit Count

Compound Is Canonicalized

Yes

Patents

Publication Number	Title	Priority Date
CN-111574668-A	Block copolymers containing hydrolyzable siloxanes, resins and process for their preparation	2020-03-25
WO-2021054284-A1	Pattern formation composition and pattern formation method	2019-09-20
JP-2021051107-A	Pattern-forming composition and pattern-forming method	2019-09-20
JP-2021051108-A	Pattern-forming composition and pattern-forming method	2019-09-20
TW-202119131-A	Pattern forming composition and pattern forming method	2019-09-20
JP-2021051312-A	Resist material and pattern formation method	2019-07-02
JP-6825741-B1	Resist material and pattern formation method	2019-07-02
WO-2021002350-A1	Resist material and method for forming pattern	2019-07-02
WO-2021002351-A1	Pattern formation method, resist material, and pattern formation device	2019-07-02
JP-2021009247-A	Resist material and pattern formation method	2019-07-02

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The dilution calculator equation

Concentration _(start) × Volume _(start) = Concentration _(final) × Volume _(final)

This equation is commonly abbreviated as: C₁V₁ = C₂V₂

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N-tert-Butyl-N-(2-methyl-1-phenylpropyl)-O-(1-phenylethyl)hydroxylamine

Product Information

Computed Properties

Patents

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