2-Nitro-p-xylylene glycol

Product Information

Molecular Formula:
C8H9NO4
Molecular Weight:
183.161
Description
As an antibacterial agent, 2-Nitro-p-xylylene glycol can effectively inhibit the proliferation of harmful bacterial and fungal species, and can be used in the development of drugs to combat occult skin infections caused by bacteria or fungi.
Synonyms
(2-Nitro-1,4-phenylene)dimethanol; 2-Nitro-p-xylene-alpha,alpha'-diol; 1,4-benzenedimethanol, 2-nitro-; [4-(hydroxymethyl)-3-nitrophenyl]methanol; 2-Nitro-1,4-benzenedimethanol; 1,4-Benzenedimethanol,2-nitro-; (2-nitrobenzene-1,4-diyl)dimethanol; 2-Nitro-p-xylylene Glycol, >/=95%; p-Xylene-alpha,alpha'-diol, 2-nitro-
IUPAC Name
[4-(hydroxymethyl)-3-nitrophenyl]methanol
Canonical SMILES
C1=CC(=C(C=C1CO)[N+](=O)[O-])CO
InChI
InChI=1S/C8H9NO4/c10-4-6-1-2-7(5-11)8(3-6)9(12)13/h1-3,10-11H,4-5H2
InChI Key
KWVHOBYJXDKIPL-UHFFFAOYSA-N
Melting Point
95 °C
Purity
>95.0%(GC)

Computed Properties

XLogP3
0
Hydrogen Bond Donor Count
2
Hydrogen Bond Acceptor Count
4
Rotatable Bond Count
2
Exact Mass
183.05315777 g/mol
Monoisotopic Mass
183.05315777 g/mol
Topological Polar Surface Area
86.3Ų
Heavy Atom Count
13
Formal Charge
0
Complexity
180
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes

Patents

Publication Number Title Priority Date
JP-2018060205-A Photosensitive resin composition, method for producing cured relief pattern, semiconductor device and display device 2017-11-06
JP-6454769-B2 Photosensitive resin composition, method for producing cured relief pattern, semiconductor device and display device 2017-11-06
JP-2019059915-A Surface treatment composition, method for producing the same, and surface treatment method using the same 2017-09-26
KR-20190035490-A Surface treatment composition, preparation method thereof, surface treatment method using the same 2017-09-26
US-2019093051-A1 Surface treatment composition, preparation method thereof, surface treatment method using the same 2017-09-26
US-10858615-B2 Surface treatment composition, preparation method thereof, surface treatment method using the same 2017-09-26
JP-2018160665-A Semiconductor device and manufacturing method thereof 2017-03-22
TW-I691525-B Semiconductor device and its manufacturing method 2017-03-22
JP-2018155938-A Photosensitive resin composition, semiconductor device manufacturing method, resin film, cured resin film, and semiconductor device 2017-03-17
JP-2021113993-A Photosensitive resin composition, manufacturing method of semiconductor device, resin film, cured resin film, and semiconductor device 2017-03-17
The molarity calculator equation

Mass (g) = Concentration (mol/L) × Volume (L) × Molecular Weight (g/mol)

The dilution calculator equation

Concentration (start) × Volume (start) = Concentration (final) × Volume (final)

This equation is commonly abbreviated as: C1V1 = C2V2

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