| Publication Number | Title | Priority Date |
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| CN-114133474-A | Resin for high-precision photoresist and preparation method thereof | 2021-11-23 |
| CN-113943391-A | Polymer resin and synthesis method thereof, photoresist containing polymer resin, preparation method of photoresist and use method of photoresist | 2021-10-15 |
| CN-112925167-A | Photoresist resin with photoacid activity and photoresist | 2021-01-26 |
| CN-112679653-A | Photoresist film-forming resin and preparation method of photoresist composition thereof | 2020-12-28 |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 2020-12-28 |
| JP-2022036009-A | Resin manufacturing method, resin, resist composition and resist pattern manufacturing method | 2020-08-20 |
| JP-2022032972-A | Positive resist material and pattern formation method | 2020-08-13 |
| KR-20220021421-A | Positive resist material and patterning process | 2020-08-13 |
| US-2022050378-A1 | Positive resist material and patterning process | 2020-08-13 |
| WO-2021251059-A1 | Rinse solution, and pattern formation method | 2020-06-11 |
