| Publication Number | Title | Priority Date |
|---|---|---|
| WO-2021111913-A1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer, and compound | 2019-12-04 |
| US-2021141308-A1 | Resist composition and method of forming resist pattern | 2019-11-11 |
| US-2021141309-A1 | Resist composition and method of forming resist pattern | 2019-11-11 |
| WO-2021065548-A1 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and electronic device manufacturing method | 2019-09-30 |
| WO-2021039654-A1 | Active-ray-sensitive or radiation-sensitive resin composition, active-ray-sensitive or radiation-sensitive film, pattern formation method, and electronic device manufacturing method | 2019-08-30 |
| US-2020393755-A1 | Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion | 2019-06-17 |
| US-2020377713-A1 | Polymers, photoresist compositions and pattern formation methods | 2019-05-31 |
| WO-2020195428-A1 | Radiation-sensitive resin composition and method for forming resist pattern | 2019-03-28 |
| US-2020218154-A1 | Resist composition and patterning process | 2019-01-08 |
| WO-2020137921-A1 | Actinic light sensitive or radiation sensitive resin composition, resist film, pattern forming method, and electronic device production method | 2018-12-28 |
