Triphenylsulfonium Nonafluorobutane-1-sulfonate
Product Information
Molecular Formula
C22H15F9O3S2
Molecular Weight
562.47
Description
Cationic photoinitiator. Photoacid generator.
Synonyms
1,1,2,2,3,3,4,4,4-nonafluoro-1-butanesulfonate;triphenylsulfonium; 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium
IUPAC Name
1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium
SMILES
C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F
InChI
InChI=1S/C18H15S.C4HF9O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h1-15H;(H,14,15,16)/q+1;/p-1
InChI Key
VLLPVDKADBYKLM-UHFFFAOYSA-M
Boiling Point
>220 °C
Melting Point
84-88 °C (lit.)
Flash Point
235.4 °F
Purity
≥ 99 %
Appearance
Solid
Application
Cationic photoinitiator.
Refractive Index
n20/D 1.5 (lit.)
LogP
7.82010
Safety Information
Hazards
H315-H319-H335
Precautionary Statement
P261, P264, P271, P280, P302+P352, P304+P340, P305+P351+P338, P312, P321, P332+P313, P337+P313, P362, P403+P233, P405, and P501
Signal Word
Warning
Computed Properties
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
12
Rotatable Bond Count
5
Exact Mass
562.03189014 g/mol
Monoisotopic Mass
562.03189014 g/mol
Topological Polar Surface Area
66.6Ų
Heavy Atom Count
36
Formal Charge
0
Complexity
576
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
2
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| CN-113582846-A | Photoresist monomer, preparation method thereof and photoresist | 2021-08-05 |
| CN-113307907-A | Nonolactone polymer resin, preparation method thereof and preparation method of 193nm photoresist composition containing same | 2021-05-01 |
| CN-112898170-A | Preparation method of acid diffusion inhibitor and photoresist composition | 2021-01-22 |
| US-2022084998-A1 | Display device and method of manufacturing the same | 2020-09-16 |
| WO-2022049911-A1 | Radiation-sensitive resin composition and pattern formation method | 2020-09-01 |
| WO-2022045219-A1 | Method for producing composition for non-photosensitive upper film formation, pattern formation method, and method for producing electronic device | 2020-08-31 |
| EP-3961676-A1 | Etching method and photosensitive resin composition | 2020-08-26 |
| JP-2022038484-A | Etching method and photosensitive resin composition | 2020-08-26 |
| WO-2022039187-A1 | Vertically phase-separated block copolymer layer | 2020-08-19 |
| WO-2022032236-A2 | Polymeric composite membranes having oriented nanochannels and methods of making the same | 2020-08-07 |
