Triphenylsulfonium Trifluoromethanesulfonate
| Catalog Number | Size | Price | Stock | Quantity |
|---|---|---|---|---|
| BPM-080804 | 10 g | $299 | In stock | |
| BPM-080804 | 25 g | $499 | In stock |
Product Information
Molecular Formula
C19H15F3O3S2
Molecular Weight
412.45
Description
Cationic photoinitiator. Photoacid generator.
Synonyms
Sulfonium, triphenyl-, 1,1,1-trifluoromethanesulfonate (1:1); Triphenylsulfonium triflate
IUPAC Name
trifluoromethanesulfonatetriphenylsulfanium
SMILES
[O-]S(=O)(=O)C(F)(F)F.c1ccc(cc1)[S+](c2ccccc2)c3ccccc3
InChI
InChI=1S/C18H15S.CHF3O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-182-1(3,4)8(5,6)7/h1-15H(H,5,6,7)/q+1/p-1
InChI Key
FAYMLNNRGCYLSR-UHFFFAOYSA-M
Boiling Point
>220 °C
Melting Point
133-137 °C (lit.)
Flash Point
235.4 °F
Purity
98%
Appearance
White to Off-white Solid
Refractive Index
n20/D 1.5 (lit.)
Safety Information
Precautionary Statement
P302+P352-P305+P351+P338
Signal Word
Warning
Computed Properties
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
6
Rotatable Bond Count
3
Exact Mass
412.04147117 g/mol
Monoisotopic Mass
412.04147117 g/mol
Topological Polar Surface Area
66.6Ų
Heavy Atom Count
27
Formal Charge
0
Complexity
346
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
2
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| US-11021614-B1 | Self-stratifying coatings | 2020-03-10 |
| WO-2021124043-A1 | Adhesive article comprising polymer and polymerizable cyclic olefins, adhesive compositions and methods | 2019-12-20 |
| WO-2021124156-A1 | Method of pattern coating adhesive composition comprising unpolymerized cyclic olefin and latent catalyst, adhesive compositions and articles | 2019-12-20 |
| US-2021181628-A1 | Resist compositions and semiconductor fabrication methods using the same | 2019-12-17 |
| WO-2021111912-A1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer, and compound | 2019-12-04 |
| WO-2021111913-A1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer, and compound | 2019-12-04 |
| WO-2021111976-A1 | Method for producing polymer | 2019-12-04 |
| WO-2021111977-A1 | Composition for forming resist underlayer film | 2019-12-04 |
| WO-2021111834-A1 | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, pattern forming method, and light emitting element | 2019-12-03 |
| WO-2021112062-A1 | Alicyclic acrylate compound, alicyclic epoxy acrylate compound, curable composition, and cured article | 2019-12-02 |
