4,4'-methylenebis(N,N-diglycidylaniline)
Product Information
Molecular Formula
C25H30N2O4
Molecular Weight
422.52
Description
4,4'-methylenebis(N,N-diglycidylaniline) is a paramount compound, extensively employed in the biomedical domain for synthesizing epoxy resins. It is an impeccable choice for fabricating polymer materials essential in the realm of biomedical applications, encompassing drug delivery mechanisms and tissue engineering scaffolds.
Synonyms
28768-32-3; 4,4'-Methylenebis(N,N-diglycidylaniline); 4,4'-Methylenebis(N,N-bis(oxiran-2-ylmethyl)aniline); 4,4-Methylenebis(N,N-diglycidylaniline); 4,4'-Methylenebis(N,N-bis(2,3-epoxypropyl)aniline); 4,4'-Methylenebis[N,N-bis(2,3-epoxypropyl)aniline]
IUPAC Name
4-[[4-[bis(oxiran-2-ylmethyl)amino]phenyl]methyl]-N,N-bis(oxiran-2-ylmethyl)aniline
SMILES
C1C(O1)CN(CC2CO2)C3=CC=C(C=C3)CC4=CC=C(C=C4)N(CC5CO5)CC6CO6
InChI
InChI=1S/C25H30N2O4/c1-5-20(26(10-22-14-28-22)11-23-15-29-23)6-2-18(1)9-19-3-7-21(8-4-19)27(12-24-16-30-24)13-25-17-31-25/h1-8,22-25H,9-17H2
InChI Key
FAUAZXVRLVIARB-UHFFFAOYSA-N
Boiling Point
619.3°C at 760mmHg
Flash Point
235.4 °CF - closed cup
Purity
95%
Density
1.15
Appearance
Light yellow to Amber to Dark green clear liquid
Refractive Index
n20/D 1.601 (lit.)
LogP
2.48540
Vapor Pressure
2.9E-15mmHg at 25°C
Safety Information
Hazards
H315:
Causes skin irritation.
H317:
May cause an allergic skin reaction.
H319:
Causes serious eye irritation.
H411:
Toxic to aquatic life with long-lasting effects.
Causes skin irritation.
H317:
May cause an allergic skin reaction.
H319:
Causes serious eye irritation.
H411:
Toxic to aquatic life with long-lasting effects.
Precautionary Statement
P261:
Avoid breathing dust, fumes, gas, mist, vapours, spray. [As modified by IV ATP].
P264:
Wash thoroughly after handling.
P273:
Avoid release to the environment.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P333+P313:
If skin irritation or a rash occurs:
Get medical advice/attention.
P391:
Collect spillage.
Avoid breathing dust, fumes, gas, mist, vapours, spray. [As modified by IV ATP].
P264:
Wash thoroughly after handling.
P273:
Avoid release to the environment.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P333+P313:
If skin irritation or a rash occurs:
Get medical advice/attention.
P391:
Collect spillage.
Computed Properties
XLogP3
2.9
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
6
Rotatable Bond Count
12
Exact Mass
422.22055744 g/mol
Monoisotopic Mass
422.22055744 g/mol
Topological Polar Surface Area
56.6Ų
Heavy Atom Count
31
Formal Charge
0
Complexity
512
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
4
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| KR-102325358-B1 | Composition for absorbing electromagnetic wave | 2021-06-03 |
| KR-102231828-B1 | Epoxy resin composition for hard coating | 2020-09-21 |
| KR-102238278-B1 | Epoxy resin composition having high reliability and high transmittance | 2020-09-21 |
| WO-2022056053-A1 | Polypropylene polymer having ultra-high melt flow rate | 2020-09-09 |
| DE-102020211111-A1 | Powder coating formulation for an insulation system of an electric machine, electric machine with such an insulation system and method for producing such an insulation system | 2020-09-03 |
| WO-2022047268-A1 | Deposition of films onto battery material powders | 2020-08-29 |
| WO-2022030468-A1 | Composition for forming resist underlayer film | 2020-08-05 |
| WO-2022030469-A1 | Composition for forming resist underlayer film | 2020-08-05 |
| JP-2022025886-A | Three-dimensional modeling equipment | 2020-07-30 |
| KR-20220015327-A | Binder resin, positive-type photosensitive resin composition, insulating film and semiconductor device | 2020-07-30 |
