N-tert-Butyl-N-(2-methyl-1-phenylpropyl)-O-(1-phenylethyl)hydroxylamine
| Catalog Number | Size | Price | Stock | Quantity |
|---|---|---|---|---|
| BPM-187954 | 2 g | $4198 | In stock |
Product Information
Molecular Formula
C22H31NO
Molecular Weight
325.49
Description
Block Copolymer Synthesis Using a Commercially Available NMP Inititator
Synonyms
2,2,5-Trimethyl-3-(1-phenylethoxy)-4-phenyl-3-azahexane, Alkoxyamine NMP initiator
IUPAC Name
N-tert-butyl-2-methyl-1-phenyl-N-(1-phenylethoxy)propan-1-amine
SMILES
CC(C)C(C1=CC=CC=C1)N(C(C)(C)C)OC(C)C2=CC=CC=C2
InChI
InChI=1S/C22H31NO/c1-17(2)21(20-15-11-8-12-16-20)23(22(4,5)6)24-18(3)19-13-9-7-10-14-19/h7-18,21H,1-6H3
InChI Key
FPFRTDOMIFBPBZ-UHFFFAOYSA-N
Flash Point
>230 °F
Appearance
solid
Storage
−20°C
Refractive Index
n20/D 1.536
Computed Properties
XLogP3
6
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
2
Rotatable Bond Count
7
Exact Mass
325.240564612 g/mol
Monoisotopic Mass
325.240564612 g/mol
Topological Polar Surface Area
12.5Ų
Heavy Atom Count
24
Formal Charge
0
Complexity
348
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
2
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| CN-111574668-A | Block copolymers containing hydrolyzable siloxanes, resins and process for their preparation | 2020-03-25 |
| WO-2021054284-A1 | Pattern formation composition and pattern formation method | 2019-09-20 |
| JP-2021051107-A | Pattern-forming composition and pattern-forming method | 2019-09-20 |
| JP-2021051108-A | Pattern-forming composition and pattern-forming method | 2019-09-20 |
| TW-202119131-A | Pattern forming composition and pattern forming method | 2019-09-20 |
| JP-2021051312-A | Resist material and pattern formation method | 2019-07-02 |
| JP-6825741-B1 | Resist material and pattern formation method | 2019-07-02 |
| WO-2021002350-A1 | Resist material and method for forming pattern | 2019-07-02 |
| WO-2021002351-A1 | Pattern formation method, resist material, and pattern formation device | 2019-07-02 |
| JP-2021009247-A | Resist material and pattern formation method | 2019-07-02 |
