Tetravinyltin
Product Information
Molecular Formula
C8H12Sn
Molecular Weight
226.89
Description
Tetravinyltin is a biomedicine chemical used in the drug development of various diseases. Its unique composition of four vinyl groups attached to a tin atom allows it to exhibit potent antifungal properties. Tetravinyltin is commonly employed in the development of antifungal drugs and treatments, targeting fungal infections such as Candidiasis and Aspergillosis within the biomedical industry.
Synonyms
TETRAVINYLTIN; TETRAVINYLTIN(IV); TIN TETRAVINYL; Sn(CH=CH2)4; Stannane, tetravinyl-; Stannane,tetraethenyl-
IUPAC Name
tetrakis(ethenyl)stannane
SMILES
C=C[Sn](C=C)(C=C)C=C
InChI
InChI=1S/4C2H3.Sn/c4*1-2;/h4*1H,2H2;
InChI Key
MZIYQMVHASXABC-UHFFFAOYSA-N
Boiling Point
158.4°C at 760 mmHg
Flash Point
40 °C
Purity
N/A
Density
1.246
Appearance
clear colorless to very light yellow liquid
Storage
Flammables area
Refractive Index
1.501 (lit.)
Safety Information
Hazards
H226 - H301 + H311 + H331
Precautionary Statement
P210 - P280 - P301 + P310 + P330 - P302 + P352 + P312 - P304 + P340 + P311
Signal Word
Danger
Computed Properties
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
0
Rotatable Bond Count
4
Exact Mass
227.996103 g/mol
Monoisotopic Mass
227.996103 g/mol
Topological Polar Surface Area
0Ų
Heavy Atom Count
9
Formal Charge
0
Complexity
107
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| CN-114053824-A | Method for recovering carbon dioxide from petroleum associated gas | 2022-01-14 |
| CN-112940376-A | Manufacturing method of puncture-resistant high-strength frozen polyethylene film | 2021-01-23 |
| WO-2022023650-A1 | Vehicle glazing element with insert and associated device with thermal imaging camera | 2020-07-30 |
| WO-2022020507-A1 | Advanced self aligned multiple patterning using tin oxide | 2020-07-23 |
| WO-2022016123-A1 | Dry deposited photoresists with organic co-reactants | 2020-07-17 |
| WO-2022016124-A1 | Photoresists containing tantalum | 2020-07-17 |
| WO-2022016126-A1 | Metal chelators for development of metal-containing photoresist | 2020-07-17 |
| WO-2022016128-A1 | Method of forming photo-sensitive hybrid films | 2020-07-17 |
| CN-113823559-A | Etching method, substrate processing apparatus, and substrate processing system | 2020-06-19 |
| KR-20210157346-A | Etching method, substrate processing apparatus, and substrate processing system | 2020-06-19 |
