TRIMETHYL(PHENYL)TIN
Product Information
Molecular Formula
C9H14Sn
Molecular Weight
240.92
Description
TRIMETHYL(PHENYL)TIN is a cutting-edge biomedicine chemical. By inhibiting designated cellular pathways, it inhibits the proliferation of malignant tumors, thereby promoting research on breast and lung malignancies.
Synonyms
TRIMETHYL(PHENYL)TIN; Phenyltrimethyl tin; Phenyltrimethylstannane; Tin, trimethylphenyl-; Trimethylmonophenyltin; Trimethylphenylstannane; Trimethylstannylbenzene; Phenyltrimethyltin(IV)
IUPAC Name
trimethyl(phenyl)stannane
SMILES
C[Sn](C)(C)c1ccccc1
InChI
InChI=1S/C6H5.3CH3.Sn/c1-2-4-6-5-3-1/h1-5H3*1H3
InChI Key
COHOGNZHAUOXPA-UHFFFAOYSA-N
Boiling Point
88°C16 mm Hg(lit.)
Melting Point
-51°C(lit.)
Flash Point
76 °C(168.8 °F)
Purity
95%
Density
1.327 g/mL at 25 °C(lit.)
Refractive Index
1.5357 (lit.)
Safety Information
Hazards
H300 + H310 + H330 - H410
Precautionary Statement
P262 - P273 - P280 - P301 + P310 + P330 - P302 + P352 + P310 - P304 + P340 + P310
Signal Word
Danger
Computed Properties
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
0
Rotatable Bond Count
1
Exact Mass
242.011753 g/mol
Monoisotopic Mass
242.011753 g/mol
Topological Polar Surface Area
0Ų
Heavy Atom Count
10
Formal Charge
0
Complexity
95.8
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| CN-113980380-A | High and low temperature resistant plastic bottle cap and manufacturing process thereof | 2021-12-08 |
| WO-2022020507-A1 | Advanced self aligned multiple patterning using tin oxide | 2020-07-23 |
| WO-2022016123-A1 | Dry deposited photoresists with organic co-reactants | 2020-07-17 |
| WO-2022016124-A1 | Photoresists containing tantalum | 2020-07-17 |
| WO-2022016126-A1 | Metal chelators for development of metal-containing photoresist | 2020-07-17 |
| WO-2022016127-A1 | Photoresists from sn(ii) precursors | 2020-07-17 |
| WO-2022016128-A1 | Method of forming photo-sensitive hybrid films | 2020-07-17 |
| WO-2022005907-A1 | Metal oxide diffusion barriers | 2020-07-01 |
| CN-113823559-A | Etching method, substrate processing apparatus, and substrate processing system | 2020-06-19 |
| JP-2022002294-A | Etching method, substrate processing equipment, and substrate processing system | 2020-06-19 |
