| Publication Number | Title | Priority Date |
|---|---|---|
| WO-2022020507-A1 | Advanced self aligned multiple patterning using tin oxide | 2020-07-23 |
| WO-2022016123-A1 | Dry deposited photoresists with organic co-reactants | 2020-07-17 |
| WO-2022016124-A1 | Photoresists containing tantalum | 2020-07-17 |
| WO-2022016127-A1 | Photoresists from sn(ii) precursors | 2020-07-17 |
| WO-2022016128-A1 | Method of forming photo-sensitive hybrid films | 2020-07-17 |
| WO-2022005907-A1 | Metal oxide diffusion barriers | 2020-07-01 |
| WO-2021202198-A1 | Apparatus and process for euv dry resist sensitization by gas phase infusion of a sensitizer | 2020-03-31 |
| WO-2021202146-A1 | Structure and method to achieve positive tone dry develop by a hermetic overlayer | 2020-03-30 |
| WO-2021146138-A1 | Underlayer for photoresist adhesion and dose reduction | 2020-01-15 |
| CN-113574456-A | Underlayer for photoresist adhesion and dose reduction | 2020-01-15 |
