Trimethyl(phenylethynyl)tin
Product Information
Molecular Formula
C11H14Sn
Molecular Weight
264.94
Description
Trimethyl(phenylethynyl)tin is a revolutionary biomedicine chemical that boasts an exceptional aptitude for combatting diverse afflictions. By selectively engaging molecular pathways, this compound exhibits pronounced efficacy in hampering the expansion and dissemination of malignant cells, promising to revolutionize cancer therapy.
Synonyms
TRIMETHYL(PHENYLETHYNYL)TIN; TRIMETHYL(PHENYLETHYNYL)TIN(IV); Trimethyl(phenylethynyl)tin,97%
IUPAC Name
trimethyl(2-phenylethynyl)stannane
SMILES
C[Sn](C)(C)C#CC1=CC=CC=C1
InChI
InChI=1S/C8H5.3CH3.Sn/c1-2-8-6-4-3-5-7-8;;;;/h3-7H;3*1H3;
InChI Key
QYYZHXHYNLXWAW-UHFFFAOYSA-N
Boiling Point
249°C at 760 mmHg
Melting Point
62-67°C
Flash Point
Not applicable
Purity
95%
Safety Information
Hazards
H300 + H310 + H330 - H410
Precautionary Statement
P262 - P273 - P280 - P301 + P310 + P330 - P302 + P352 + P310 - P304 + P340 + P310
Signal Word
Danger
Computed Properties
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
0
Rotatable Bond Count
2
Exact Mass
266.011753 g/mol
Monoisotopic Mass
266.011753 g/mol
Topological Polar Surface Area
0Ų
Heavy Atom Count
12
Formal Charge
0
Complexity
192
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| WO-2022020507-A1 | Advanced self aligned multiple patterning using tin oxide | 2020-07-23 |
| WO-2022016123-A1 | Dry deposited photoresists with organic co-reactants | 2020-07-17 |
| WO-2022016124-A1 | Photoresists containing tantalum | 2020-07-17 |
| WO-2022016127-A1 | Photoresists from sn(ii) precursors | 2020-07-17 |
| WO-2022016128-A1 | Method of forming photo-sensitive hybrid films | 2020-07-17 |
| WO-2022005907-A1 | Metal oxide diffusion barriers | 2020-07-01 |
| WO-2021202198-A1 | Apparatus and process for euv dry resist sensitization by gas phase infusion of a sensitizer | 2020-03-31 |
| WO-2021202146-A1 | Structure and method to achieve positive tone dry develop by a hermetic overlayer | 2020-03-30 |
| WO-2021146138-A1 | Underlayer for photoresist adhesion and dose reduction | 2020-01-15 |
| CN-113574456-A | Underlayer for photoresist adhesion and dose reduction | 2020-01-15 |
