5,5-(Hexafluoroisopropylidene)di-o-toluidine
Product Information
Molecular Formula
C17H16F6N2
Molecular Weight
362.31
Description
5,5-(Hexafluoroisopropylidene)di-o-toluidine is an indispensable entity within the realm of biomedical applications. Its can facilitate the meticulous design and amalgamation of diverse pharmacological agents and intricately structured organic molecules. By virtue of its unrivaled prowess, this compound emerges as an indispensable player in the intricate domain of disease treatment and regulation, orchestrating the synthesis of precisely tailored therapeutics boasting targeted efficacy.
Synonyms
116325-74-7; 2,2-Bis(3-amino-4-methylphenyl)hexafluoropropane; 5,5'-(Hexafluoroisopropylidene)di-o-toluidine; 5,5'-(Perfluoropropane-2,2-diyl)bis(2-methylaniline); 5-[2-(3-amino-4-methylphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-methylaniline; ST50997708
IUPAC Name
5-[2-(3-amino-4-methylphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-methylaniline
SMILES
CC1=C(C=C(C=C1)C(C2=CC(=C(C=C2)C)N)(C(F)(F)F)C(F)(F)F)N
InChI
InChI=1S/C17H16F6N2/c1-9-3-5-11(7-13(9)24)15(16(18,19)20,17(21,22)23)12-6-4-10(2)14(25)8-12/h3-8H,24-25H2,1-2H3
InChI Key
HJSYPLCSZPEDCQ-UHFFFAOYSA-N
Boiling Point
377.4°C at 760mmHg
Melting Point
112-115°C(lit.)
Purity
95%
Density
1.329g/cm3
Appearance
White to Light yellow to Light red powder to crystal
Safety Information
Hazards
H315:
Causes skin irritation.
H319:
Causes serious eye irritation.
Causes skin irritation.
H319:
Causes serious eye irritation.
Precautionary Statement
P264:
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Computed Properties
XLogP3
5.2
Hydrogen Bond Donor Count
2
Hydrogen Bond Acceptor Count
8
Rotatable Bond Count
2
Exact Mass
362.12176749 g/mol
Monoisotopic Mass
362.12176749 g/mol
Topological Polar Surface Area
52Ų
Heavy Atom Count
25
Formal Charge
0
Complexity
419
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| WO-2022030429-A1 | Photosensitive resin composition, photosensitive resin film, patterned resin film, cured product, patterned cured product, method for producing electronic device, and electronic device | 2020-08-05 |
| WO-2022030447-A1 | Fluorinated diamine or salt thereof, method for producing fluorinated diamine or salt thereof, polyamide, method for producing polyamide, polyamide solution, cyclized polyamide, method for producing cyclized polyamide, insulating material for high-frequency electronic component, method for producing insulating material for high-frequency electronic component, high-frequency electronic component, high-frequency appliance, and insulating material for producing high-frequency electronic component | 2020-08-05 |
| JP-2022019609-A | Photosensitive resin composition, manufacturing method of electronic device, manufacturing method of electronic device and photosensitive resin composition | 2020-07-16 |
| US-2022017673-A1 | Dielectric Film Forming Compositions | 2020-07-15 |
| WO-2022015695-A1 | Dielectric film forming compositions | 2020-07-15 |
| WO-2022009782-A1 | Polybenzoxazole, polyamide, polyamide solution, insulation for high-frequency electronic component, high-frequency electronic component, high-frequency equipment, insulation material for producing high-frequency electronic component, method for producing polyamide, method for producing polybenzoxazole, method for producing insulation for high-frequency electronic component, and diamine or salt thereof | 2020-07-10 |
| JP-2021193411-A | Photosensitive resin composition, manufacturing method of electronic device and electronic device | 2020-06-08 |
| KR-20210138351-A | Polyimide film having low reflexibility | 2020-05-12 |
| WO-2021199798-A1 | Inorganic substrate/engineering plastic film laminate equipped with protective film, laminate stack, method for storing laminate, and method for transporting laminate | 2020-03-31 |
| JP-2021161285-A | Polyimide adhesive | 2020-03-31 |
