Methacrylic acid 4,7-methanooctahydro-1H-indene-5-yl ester
Product Information
Molecular Formula
C14H20O2
Molecular Weight
220.31
Description
Methacrylic acid 4,7-methanooctahydro-1H-indene-5-yl ester is a biomedicine renowned for its multifaceted application. It showcases tremendous potentiality in combatting diverse pathological afflictions, encompassing neoplastic malignancies and aberrant immune responses. Revealing its supremacy as an efficacious hindrance agent, it selectively antagonizes disease-propagating enzymes or receptors, thus emerging as an auspicious contender for pharmaceutical innovation and curative interventions.
Synonyms
TETRAHYDRODICYCLOPENTADIENYL METHACRYLATE; METHACRYLIC ACID DICYCLOPENTANYL ESTER; METHACRYLIC ACID TETRAHYDRODICYCLOPENTADIENYL ESTER; DICYCLOPENTANYL METHACRYLATE; Octahydro-4,7-methano-1H-inden-5-yl 2-methyl-2-propenoate; Dicyclopentanyl Methacrylate (stab
IUPAC Name
8-tricyclo[5.2.1.02,6]decanyl 2-methylprop-2-enoate
SMILES
CC(=C)C(=O)OC1CC2CC1C3C2CCC3
InChI
InChI=1S/C14H20O2/c1-8(2)14(15)16-13-7-9-6-12(13)11-5-3-4-10(9)11/h9-13H,1,3-7H2,2H3
InChI Key
NWAHZAIDMVNENC-UHFFFAOYSA-N
Flash Point
145 °C
Purity
>95.0%(GC)
Density
1.04
Appearance
Colorless to Almost colorless clear liquid
Storage
<0°C
Safety Information
Hazards
H315:
Causes skin irritation.
H319:
Causes serious eye irritation.
Causes skin irritation.
H319:
Causes serious eye irritation.
Precautionary Statement
P264:
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Computed Properties
XLogP3
3.8
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
2
Rotatable Bond Count
3
Exact Mass
220.146329876 g/mol
Monoisotopic Mass
220.146329876 g/mol
Topological Polar Surface Area
26.3Ų
Heavy Atom Count
16
Formal Charge
0
Complexity
334
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
5
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| TW-I739360-B | Negative photosensitive resin composition and use thereof | 2020-03-26 |
| JP-2021091770-A | A method for manufacturing a coloring composition, an infrared light cut filter, a filter for a solid-state image sensor, a solid-state image sensor, and a filter for a solid-state image sensor. | 2019-12-09 |
| WO-2021106535-A1 | Active-ray-sensitive or radiation-sensitive resin composition, pattern formation method, and electronic device manufacturing method | 2019-11-29 |
| WO-2021054410-A1 | Infrared blocking filter, filter for solid-state imaging elements, solid-state imaging element, and method for producing filter for solid-state imaging elements | 2019-09-17 |
| WO-2021039654-A1 | Active-ray-sensitive or radiation-sensitive resin composition, active-ray-sensitive or radiation-sensitive film, pattern formation method, and electronic device manufacturing method | 2019-08-30 |
| WO-2021039391-A1 | Active light ray-sensitive or radiation-sensitive resin composition, active light ray-sensitive or radiation-sensitive film, method for forming pattern, and method for producing electronic device | 2019-08-29 |
| TW-202111431-A | Negative photosensitive resin composition, cured film, organic EL display, and manufacturing method of cured film | 2019-07-10 |
| CN-114127638-A | Negative photosensitive resin composition, cured film, organic EL display, and method for producing cured film | 2019-07-10 |
| US-2021007218-A1 | Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate | 2019-07-01 |
| CN-111983744-A | Optical film and method for producing optical film | 2019-05-23 |
