1-Ethylcyclopentyl methacrylate
Product Information
Molecular Formula
C11H18O2
Molecular Weight
182.26
Description
1-Ethylcyclopentyl Methacrylate, stabilized with MEHQ, is meticulously employed as a distinct monomer while formulating polymeric systems for the precise delivery of medical drugs. It plays a pivotal role in engineering specialized drugs aimed at diverse ailments, predominantly cancer, augmenting their bioavailability efficaciously.
Synonyms
2-Propenoic acid, 2-methyl-, 1-ethylcyclopentyl ester; 1-ethylcyclopentyl ester
IUPAC Name
(1-ethylcyclopentyl) 2-methylprop-2-enoate
SMILES
CCC1(CCCC1)OC(=O)C(=C)C
InChI
InChI=1S/C11H18O2/c1-4-11(7-5-6-8-11)13-10(12)9(2)3/h2,4-8H2,1,3H3
InChI Key
FMEBJQQRPGHVOR-UHFFFAOYSA-N
Flash Point
85 °C
Purity
>98.0%(GC)
Appearance
Colorless to Light yellow to Light orange clear liquid
Storage
0-10°C
Computed Properties
XLogP3
3.1
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
2
Rotatable Bond Count
4
Exact Mass
182.130679813 g/mol
Monoisotopic Mass
182.130679813 g/mol
Topological Polar Surface Area
26.3Ų
Heavy Atom Count
13
Formal Charge
0
Complexity
212
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| CN-114133474-A | Resin for high-precision photoresist and preparation method thereof | 2021-11-23 |
| CN-113943391-A | Polymer resin and synthesis method thereof, photoresist containing polymer resin, preparation method of photoresist and use method of photoresist | 2021-10-15 |
| CN-112925167-A | Photoresist resin with photoacid activity and photoresist | 2021-01-26 |
| CN-112679653-A | Photoresist film-forming resin and preparation method of photoresist composition thereof | 2020-12-28 |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 2020-12-28 |
| JP-2022036009-A | Resin manufacturing method, resin, resist composition and resist pattern manufacturing method | 2020-08-20 |
| JP-2022032972-A | Positive resist material and pattern formation method | 2020-08-13 |
| KR-20220021421-A | Positive resist material and patterning process | 2020-08-13 |
| US-2022050378-A1 | Positive resist material and patterning process | 2020-08-13 |
| WO-2021251059-A1 | Rinse solution, and pattern formation method | 2020-06-11 |
