2-Isopropyl-2-methacryloyloxyadamantane
Product Information
Molecular Formula
C17H26O2
Molecular Weight
262.39
Description
2-Isopropyl-2-methacryloyloxyadamantane, an immensely versatile compound extensively employed in the burgeoning biomedical realm, primarily owing to its remarkable anti-inflammatory attributes and immense potential in the realm of drug delivery systems.
Synonyms
2-Isopropyl-2-adamantyl Methacrylate||||Methacrylic Acid 2-Isopropyl-2-adamantyl Ester
IUPAC Name
(2-propan-2-yl-2-adamantyl) 2-methylprop-2-enoate
SMILES
CC(C)C1(C2CC3CC(C2)CC1C3)OC(=O)C(=C)C
InChI
InChI=1S/C17H26O2/c1-10(2)16(18)19-17(11(3)4)14-6-12-5-13(8-14)9-15(17)7-12/h11-15H,1,5-9H2,2-4H3
InChI Key
ZMAOPHHNBQIJOQ-UHFFFAOYSA-N
Melting Point
40 °C
Flash Point
136 °C
Purity
>98.0%(GC)
Appearance
White to Almost white powder to crystal
Storage
0-10°C
Safety Information
Hazards
H315:
Causes skin irritation.
H319:
Causes serious eye irritation.
Causes skin irritation.
H319:
Causes serious eye irritation.
Precautionary Statement
P264:
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Computed Properties
XLogP3
4.6
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
2
Rotatable Bond Count
4
Exact Mass
262.193280068 g/mol
Monoisotopic Mass
262.193280068 g/mol
Topological Polar Surface Area
26.3Ų
Heavy Atom Count
19
Formal Charge
0
Complexity
380
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| CN-113253572-A | Intelligent reversible photosensitive femtosecond laser photoresist and photoetching processing method | 2021-05-14 |
| CN-111983892-A | Photoinduction anti-oxygen polymerization inhibition femtosecond laser photoresist and preparation method thereof | 2020-09-02 |
| CN-111999981-A | Intelligent femtosecond laser photoresist composition and patterning method | 2020-09-02 |
| KR-20210150216-A | Composition of Low Dielectric Coating Solution Containing Aliphatic Polycyclic Acrylic Monomer | 2020-06-03 |
| JP-2021147472-A | A method for producing a copolymer, a resist composition, and a substrate on which a pattern is formed. | 2020-03-18 |
| KR-20210070048-A | Composition of Low Dielectric Coating Solution Containing Adamantyl Acrylic Monomer | 2019-12-04 |
| KR-102323778-B1 | Composition of Low Dielectric Coating Solution Containing Adamantyl Acrylic Monomer | 2019-12-04 |
| WO-2021106535-A1 | Active-ray-sensitive or radiation-sensitive resin composition, pattern formation method, and electronic device manufacturing method | 2019-11-29 |
| US-2021132495-A1 | Resist composition and method of forming resist pattern | 2019-11-06 |
| JP-2021070698-A | Method for producing salt, acid generator, resist composition and resist pattern | 2019-10-29 |
