2-Methyl-2-Adamantyl Methacrylate
Product Information
Molecular Formula
C15H22O2
Molecular Weight
234.33
Description
2-Methyl-2-Adamantyl Methacrylate is an important biomedical product. As a monomer component, it facilitates the fusion of hydrophobic substances, thereby improving the solubility and stability of pharmaceutical agents.
Synonyms
2-Methacryloyloxy-2-methyladamantane; 2-Methyl-2-adamantyl methacrylate
IUPAC Name
(2-methyl-2-adamantyl) 2-methylprop-2-enoate
SMILES
CC(=C)C(=O)OC1(C2CC3CC(C2)CC1C3)C
InChI
InChI=1S/C15H22O2/c1-9(2)14(16)17-15(3)12-5-10-4-11(7-12)8-13(15)6-10/h10-13H,1,4-8H2,2-3H3
InChI Key
FDYDISGSYGFRJM-UHFFFAOYSA-N
Boiling Point
301.311°C at 760 mmHg
Flash Point
120 °C
Purity
99%
Density
1.061g/cm3
Appearance
Colorless to Almost colorless clear liquid
Storage
<0°C
Safety Information
Hazards
H315:
Causes skin irritation.
H319:
Causes serious eye irritation.
Causes skin irritation.
H319:
Causes serious eye irritation.
Precautionary Statement
P264:
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Computed Properties
XLogP3
3.7
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
2
Rotatable Bond Count
3
Exact Mass
234.161979940 g/mol
Monoisotopic Mass
234.161979940 g/mol
Topological Polar Surface Area
26.3Ų
Heavy Atom Count
17
Formal Charge
0
Complexity
341
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
0
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| CN-113943391-A | Polymer resin and synthesis method thereof, photoresist containing polymer resin, preparation method of photoresist and use method of photoresist | 2021-10-15 |
| WO-2022034831-A1 | Composition for forming underlayer film for lithography, underlayer film, and pattern forming method | 2020-08-14 |
| WO-2022014679-A1 | Polymer, composition, method for producing polymer, composition, film-forming composition, resist composition, radiation-sensitive composition, composition for forming underlayer film for lithography, method for forming resist pattern, method for producing underlayer film for lithography, method for forming circuit pattern, and composition for forming optical member | 2020-07-15 |
| WO-2022014684-A1 | Polycyclic polyphenol resin, composition, method for producing polycyclic polyphenol resin, composition for forming film, resist composition, method for forming resist pattern, radiation-sensitive composition, composition for forming under layer film for lithography, method for producing under layer film for lithography, method for forming circuit pattern, and composition for forming optical member | 2020-07-15 |
| WO-2022009948-A1 | Composition for forming lithography film, resist pattern forming method, and circuit pattern forming method | 2020-07-08 |
| WO-2022009966-A1 | Composition for forming film, resist composition, radiation-sensitive composition, amorphous film production method, resist pattern formation method, composition for forming underlayer film for lithography, circuit pattern formation method and production method for underlayer film for lithography, composition for forming optical member, resin for forming film, resist resin, radiation-sensitive resin, and resin for forming underlayer film for lithography | 2020-07-08 |
| WO-2021230184-A1 | Compound, production method therefor, acid generator, composition, resist film, underlayer film, pattern formation method, and optical component | 2020-05-11 |
| WO-2021230185-A1 | Compound, production method therefor, composition, resist film, and pattern formation method | 2020-05-11 |
| JP-2021100996-A | Block copolymers, resin compositions and adhesive films | 2019-12-24 |
| WO-2021112194-A1 | Composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, oligomer, and purification method | 2019-12-04 |
