2-Oxohexahydro-2H-3,5-methanocyclopenta[b]furan-6-yl Methacrylate
Product Information
Molecular Formula
C12H14O4
Molecular Weight
222.24
Description
2-Oxohexahydro-2H-3,5-methanocyclopenta[b]furan-6-yl Methacrylate is an intriguing and multifaceted compound that pervasively employed in the biomedical field, assumes a momentous function in the advancement of pharmaceuticals focused on an array of ailments encompassing cancer, inflammation, and neurological disorders. Distinguished by its distinctive chemical constitution and pharmacological attributes, this derivative of methacrylate manifests auspicious therapeutic prospects of great import.
Synonyms
Methacrylic Acid 2-Oxohexahydro-2H-3,5-methanocyclopenta[b]furan-6-yl Ester||||5-Methacroyloxy-2,6-norbornane Carbolactone
IUPAC Name
(5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 2-methylprop-2-enoate
SMILES
CC(=C)C(=O)OC1C2CC3C1OC(=O)C3C2
InChI
InChI=1S/C12H14O4/c1-5(2)11(13)15-9-6-3-7-8(4-6)12(14)16-10(7)9/h6-10H,1,3-4H2,2H3
InChI Key
JJMQLQLMPJLIPZ-UHFFFAOYSA-N
Boiling Point
367.7±25.0 °C(Predicted)
Melting Point
102 °C
Purity
>98.0%(GC)
Density
1.26±0.1 g/cm3(Predicted)
Appearance
White to Almost white powder to crystal
Safety Information
Hazards
H315:
Causes skin irritation.
H319:
Causes serious eye irritation.
Causes skin irritation.
H319:
Causes serious eye irritation.
Precautionary Statement
P264:
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Computed Properties
XLogP3
1.6
Hydrogen Bond Donor Count
0
Hydrogen Bond Acceptor Count
4
Rotatable Bond Count
3
Exact Mass
222.08920892 g/mol
Monoisotopic Mass
222.08920892 g/mol
Topological Polar Surface Area
52.6Ų
Heavy Atom Count
16
Formal Charge
0
Complexity
387
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
5
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| WO-2021111913-A1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer, and compound | 2019-12-04 |
| US-2021141308-A1 | Resist composition and method of forming resist pattern | 2019-11-11 |
| US-2021141309-A1 | Resist composition and method of forming resist pattern | 2019-11-11 |
| WO-2021065548-A1 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and electronic device manufacturing method | 2019-09-30 |
| WO-2021039654-A1 | Active-ray-sensitive or radiation-sensitive resin composition, active-ray-sensitive or radiation-sensitive film, pattern formation method, and electronic device manufacturing method | 2019-08-30 |
| US-2020393755-A1 | Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion | 2019-06-17 |
| US-2020377713-A1 | Polymers, photoresist compositions and pattern formation methods | 2019-05-31 |
| WO-2020195428-A1 | Radiation-sensitive resin composition and method for forming resist pattern | 2019-03-28 |
| US-2020218154-A1 | Resist composition and patterning process | 2019-01-08 |
| WO-2020137921-A1 | Actinic light sensitive or radiation sensitive resin composition, resist film, pattern forming method, and electronic device production method | 2018-12-28 |
