N-hydroxy-5-norbornene-2,3-second imide
Product Information
Molecular Formula
C8H10O3
Molecular Weight
154.16
Description
N-hydroxy-5-norbornene-2,3-second imide is an indispensable compound extensively employed in the biomedical field. It showcases remarkable anti-inflammatory attributes and finds application in the management of diverse ailments such as rheumatoid arthritis, multiple sclerosis, and asthma. Its mechanism involves the inhibition of distinct enzymes and the modulation of immune responses, thereby presenting a propitious therapeutic avenue for effectively attenuating these morbidities.
Synonyms
6-Hydroxyhexahydro-2H-3,5-methanocyclopenta[b]furan-2-one
IUPAC Name
2-hydroxy-4-oxatricyclo[4.2.1.03,7]nonan-5-one
SMILES
C1C2CC3C1C(C2O)OC3=O
InChI
InChI=1S/C8H10O3/c9-6-3-1-4-5(2-3)8(10)11-7(4)6/h3-7,9H,1-2H2
InChI Key
SCDJKGVPVLZLED-UHFFFAOYSA-N
Boiling Point
365.2 °C / 760 mmHg
Melting Point
158 °C
Flash Point
174.7 °C
Purity
>98.0%(GC)
Density
1.451 g/mL
Appearance
White to Almost white powder to crystal
Storage
Sealed in dry. Room temperature.
Refractive Index
1.599
Safety Information
Hazards
H315:
Causes skin irritation.
H319:
Causes serious eye irritation.
Causes skin irritation.
H319:
Causes serious eye irritation.
Precautionary Statement
P264:
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Wash thoroughly after handling.
P280:
Wear protective gloves/protective clothing/eye protection/face protection.
P302+P352:
IF ON SKIN:
Wash with plenty of soap and water.
P332+P313:
If skin irritation occurs:
Get medical advice/attention.
P337+P313:
If eye irritation persists:
Get medical advice/attention.
P362+P364:
Take off contaminated clothing. [As modified by IV ATP].
And wash it before reuse. [Added by IV ATP].
Signal Word
Warning
Computed Properties
XLogP3
0.1
Hydrogen Bond Donor Count
1
Hydrogen Bond Acceptor Count
3
Rotatable Bond Count
0
Exact Mass
154.062994177 g/mol
Monoisotopic Mass
154.062994177 g/mol
Topological Polar Surface Area
46.5Ų
Heavy Atom Count
11
Formal Charge
0
Complexity
225
Isotope Atom Count
0
Defined Atom Stereocenter Count
0
Undefined Atom Stereocenter Count
5
Defined Bond Stereocenter Count
0
Undefined Bond Stereocenter Count
0
Covalently-Bonded Unit Count
1
Compound Is Canonicalized
Yes
Patents
| Publication Number | Title | Priority Date |
|---|---|---|
| JP-2021175729-A | Method for Producing Carboxylate, Carboxylic Acid Generator, Resist Composition and Resist Pattern | 2020-04-22 |
| WO-2021019942-A1 | Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method | 2019-07-30 |
| TW-202112857-A | Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method | 2019-07-30 |
| CN-114206954-A | Monomer, resin for photoresist, resin composition for photoresist, and pattern formation method | 2019-07-30 |
| US-2021072642-A1 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin | 2018-07-06 |
| TW-202004339-A | Resist composition, method of forming resist pattern, compound, and acid generator | 2018-05-28 |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | 2018-05-28 |
| US-11256169-B2 | Resist composition, and method of forming resist pattern | 2018-05-28 |
| JP-WO2017179727-A1 | Radiation sensitive resin composition, resist pattern forming method and radiation sensitive acid generator | 2016-04-15 |
| WO-2017179727-A1 | Radiation sensitive resin composition, resist pattern forming method and radiation sensitive acid generator | 2016-04-15 |
